| 摘要 |
<p>PURPOSE: A photosensitive resin composition, a hardened film using the same, a manufacturing method thereof, an organic EL display device and a liquid crystal display device are provided to be able to manufacture a photosensitive resin composition having high chemical resistance after curing and a very high sensitivity by obtaining a hardened film with low transparency decline in heating. CONSTITUTION: A photosensitive resin composition comprises a resin with the acetal structure in which the alkali solubility is changed with the acid action, a photo acid generator, a cross-linking agent, and a solvent. The cross-linking agent includes a block isocyanate compound. The parent structure of the block isocyanate compound is the burette structure. The isocyanate functional group of the block isocyanate compound is blocked by a blocking agent selected from the group consisting of oxime compound, lactam compound, phenol compound, alcohol compound, amine compound, activated methylene compound, pyrazole compound, mercaptan compound, imidazole compound, and imide compound. The photo acid generator is oxime sulfonate compound. A liquid crystal display device(10) uses the photosensitive resin composition.</p> |
