发明名称 SPUTTERING METHOD
摘要 When sputtering method is performed by disposing a plurality of targets in parallel with each other, and by charging power to the targets through a plurality of bipolar pulsed power supplies, power can be charged with higher accuracy to the targets while being subject to less effect by the switching noises by a simple control. In a sputtering method in which, for each of targets making a pair, power is supplied in a bipolar pulsed mode by switching ON or OFF of each of the switching elements SW1 through SW4 in a bridge circuit that is connected to positive and negative DC output ends from the DC power supply source, and in which each of the targets is sputtered, switching ON or OFF of the switching elements is performed in a short-circuited state of an output-short-circuiting switching element SW0 which is disposed between positive and negative DC outputs from the DC power supply source. The timing of shifting the output-short-circuiting switching element is mutually deviated from bridge circuit to bridge circuit.
申请公布号 KR101250336(B1) 申请公布日期 2013.04.03
申请号 KR20107025302 申请日期 2009.05.20
申请人 发明人
分类号 C23C14/34;H01L21/285;H05H1/46 主分类号 C23C14/34
代理机构 代理人
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