Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus

摘要

A large surface substrate (5, 5a) is Rf vacuum plasma treated with the help of an electrode arrangement (9) consisting of an even number of electrode strips (9a, 9b). At least one of the strips is Rf supplied at least two distinct loci (P1, P2) along the central axis (A) of the addressed strip (9a).