发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device including two silicon wafers stacked and bonded together with bumps of one wafer electrically coupled with those of the other wafer, in which generation of voids on the junction surface between the silicon wafers is suppressed. Due to a recess made in the surface of a buried conductive film, a cavity is formed in the junction surface between the silicon wafers. The ends of the cavity extend to the periphery of the junction surface between the silicon wafers. This allows the air trapped on the junction surface between the silicon wafers to get out through the cavity, thereby reducing the possibility of generation of voids on the junction surface.
申请公布号 US8410615(B2) 申请公布日期 2013.04.02
申请号 US201113178470 申请日期 2011.07.07
申请人 AOKI MAYU;TAKEDA KENICHI;HOZAWA KAZUYUKI;HITACHI, LTD. 发明人 AOKI MAYU;TAKEDA KENICHI;HOZAWA KAZUYUKI
分类号 H01L21/28 主分类号 H01L21/28
代理机构 代理人
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