发明名称 |
Mask system employing substantially circular optical proximity correction target and method of manufacture thereof |
摘要 |
A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target. |
申请公布号 |
US8413083(B2) |
申请公布日期 |
2013.04.02 |
申请号 |
US20090465431 |
申请日期 |
2009.05.13 |
申请人 |
TAN SIA KIM;CHUA GEK SOON;YEO KWEE LIANG MARTIN;CHONG RYAN KHOON KHYE;LING MOH LUNG;GLOBALFOUNDRIES SINGAPORE PTE. LTD. |
发明人 |
TAN SIA KIM;CHUA GEK SOON;YEO KWEE LIANG MARTIN;CHONG RYAN KHOON KHYE;LING MOH LUNG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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