发明名称 Solid-state imaging device and method for producing the same
摘要 A solid-state imaging device includes a first substrate including a light-sensing portion configured to perform photoelectric conversion of incident light and a wiring portion provided on a light-incident side; an optically transparent second substrate provided on a wiring portion side of the first substrate at a certain distance; a through-hole provided in the first substrate; a through-via provided in the through-hole; a front-surface-side electrode connected to the through-via and provided on a front surface of the first substrate; a back-surface-side electrode connected to the through-via and provided on a back surface of the first substrate; and a stopper electrode provided on the front-surface-side electrode and filling a space between the front-surface-side electrode and the second substrate.
申请公布号 US8410569(B2) 申请公布日期 2013.04.02
申请号 US20100842583 申请日期 2010.07.23
申请人 YOSHIHARA IKUO;NAGATA MASAYA;SASAKI NAOTO;UMEBAYASHI TAKU;TAKAHASHI HIROSHI;OTSUKA YOICHI;KITAMURA ISAYA;KANEGUCHI TOKIHISA;INOUE KEISHI;HAYASHI TOSHIHIKO;MATSUGAI HIROYASU;AONUMA MAYOSHI;YOSHIOKA HIROSHI;SONY CORPORATION 发明人 YOSHIHARA IKUO;NAGATA MASAYA;SASAKI NAOTO;UMEBAYASHI TAKU;TAKAHASHI HIROSHI;OTSUKA YOICHI;KITAMURA ISAYA;KANEGUCHI TOKIHISA;INOUE KEISHI;HAYASHI TOSHIHIKO;MATSUGAI HIROYASU;AONUMA MAYOSHI;YOSHIOKA HIROSHI
分类号 H01L27/146 主分类号 H01L27/146
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