| 摘要 |
A method for designing masks adapted to the forming of integrated circuits, including the steps of: (a) forming a first test file including a set of configurations of integrated circuit elements; (b) forming a second test file comprising the elements of the first test file, less the elements corresponding to configurations forbidden by design rule manuals; (c) trans-forming the second test file by means of a set of logical operations implemented by computing means to obtain a mask file; (d) testing the mask file and, if the test is negative, modifying the design rule manuals; and (e) repeating steps (a) to (d) until the test of step (d) is positive. |
