A BEAM MONITORING DEVICE, METHOD AND SYSTEM

摘要

PURPOSE: A beam monitoring device, a monitoring method, and a monitoring system are provided to control an implant process by correcting an ion beam generating unit. CONSTITUTION: A one-dimension profiler(110) comprises insulating materials and a faraday(116) having conductive materials. A two-dimension profiler(112) comprises multiple faradays(120) having insulating materials and conductive materials. A control arm(114) operates in order to facilitate the movement of a beam monitoring device in a longitudinal direction. The control arm facilitates the rotation around an axis of the beam monitoring device.