发明名称 |
Registered structure formation via the application of directed thermal energy to diblock copolymer films |
摘要 |
Methods for fabricating sub-lithographic, nanoscale linear microchannel arrays over surfaces without defined features utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Embodiments of the methods use a multi-layer induced ordering approach to align lamellar films to an underlying base film within trenches, and localized heating to anneal the lamellar-phase block copolymer film overlying the trenches and outwardly over the remaining surface.
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申请公布号 |
US8409449(B2) |
申请公布日期 |
2013.04.02 |
申请号 |
US201113337567 |
申请日期 |
2011.12.27 |
申请人 |
MILLWARD DAN B.;MARSH EUGENE P.;MICRON TECHNOLOGY, INC. |
发明人 |
MILLWARD DAN B.;MARSH EUGENE P. |
分类号 |
B44C1/22;B82B3/00;H01L21/302 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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地址 |
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