| 摘要 |
PURPOSE: A substrate inspection apparatus and method using plasma are provided to reduce damage to a substrate and to measure property of a circuit formed on the substrate with low voltage by applying a voltage value of the low voltage applied to the substrate. CONSTITUTION: A substrate inspection apparatus(100) comprises a process chamber(110), a gas supply unit(120), an electricity inspection unit(150), and a variable DC voltage source(140). The process chamber comprises a plasma generation space. The gas supply unit supplies reaction gas inside the processing chamber for creating plasma. The electricity inspection unit is placed on the bottom of the substrate and measures current or voltage of a circuit formed on a substrate. The variable DC voltage source applies bias to the lower side of the substrate and controls change of current and resistance of sheathing formed between the plasma and the substrate. |
