发明名称 POLISHING COMPOSITION
摘要 <p>A POLISHING COMPOSITION INCLUDES A COPOLYMER AND AN ABRASIVE. THE COPOLYMER HAS A CONSTITUTIONAL UNIT EXPRESSED AS THE FOLLOWING FORMULA (I) AND AT LEAST ONE OF CONSTITUTIONAL UNITS EXPRESSED AS THE FOLLOWING FORMULAS (II) TO (IV). METHOXYPOLYETHYLENE GLYCOL METHACRYLATE ETC. ARE USED AS MONOMERS FOR FORMING THE CONSTITUTIONAL UNIT OF THE FORMULA (I), STEARYL METHACRYLATE ETC. ARE USED AS MONOMERS FOR FORMING THE CONSTITUTIONAL UNIT OF THE FORMULA (II), POLYPROPYLENE GLYCOL METHACRYLATE ETC. ARE USED AS MONOMERS FOR FORMING THE CONSTITUTIONAL UNIT OF THE FORMULA (III), AND STYRENE ETC. ARE USED AS MONOMERS FOR FORMING THE CONSTITUTIONAL UNIT OF THE FORMULA (IV).</p>
申请公布号 MY148358(A) 申请公布日期 2013.03.29
申请号 MY2007PI01499 申请日期 2007.09.06
申请人 KAO CORPORATION 发明人 MASAHIKO SUZUKI;YUICHI HOMMA;YUKIKO YAMAWAKI
分类号 C09G1/02 主分类号 C09G1/02
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