发明名称 |
Simulation And Correction Of Mask Shadowing Effect |
摘要 |
Disclosed are techniques for simulating and correcting the mask shadowing effect using the domain decomposition method (DDM). According to various implementations of the invention, DDM signals for an extreme ultraviolet (EUV) lithography mask are determined for a plurality of azimuthal angles of illumination. Base on the DDM signals, one or more layout designs for making the mask may be analyzed and/or modified.
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申请公布号 |
US2013080982(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
US201113244070 |
申请日期 |
2011.09.23 |
申请人 |
WORD JAMES C;ADAM KONSTANTINOS G;LAM MICHAEL;KOMIRENKO SERGIY;MENTOR GRAPHICS CORPORATION |
发明人 |
WORD JAMES C;ADAM KONSTANTINOS G;LAM MICHAEL;KOMIRENKO SERGIY |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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