Substrate processing system for treating disk-shaped substrates in horizontal position, has heat shields arranged on end regions of transport rollers, which project over substrate to be treated

摘要

#CMT# #/CMT# The system has an area bounded by chamber walls of a conditioning chamber. A substrate processing apparatus and a transport device are arranged within the conditioning chamber. Lower heaters (4) are arranged between transport rollers (3). An upper heat shield (7) is arranged above a substrate plane. The lower heaters in axial direction of the transport rollers comprise a greater expansion than a substrate to be treated. Heat shields (9) are arranged on end regions of the transport rollers, which project over the substrate to be treated. #CMT# : #/CMT# The heat shield is formed in a curved or multiple bent manners. #CMT#USE : #/CMT# Substrate processing system for treating disk-shaped substrates in a horizontal position. #CMT#ADVANTAGE : #/CMT# The system allows heat sinks to be connected together for heat dissipation so as to increase thermal shield. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic view of a substrate processing system. 3 : Transport rollers 4 : Lower heaters 5 : Lower heat shield 7 : Upper heat shield 9 : Heat shields.