| 摘要 |
A method for producing a semiconductor device for improving production efficiency and the flexibility of production design thereof is provided. The method includes preparing semiconductor chips having a first main surface on which an electroconductive member is formed, preparing a supporting structure in which over a support configured to transmit radiation, a radiation curable pressure-sensitive adhesive layer and a first thermosetting resin layer are laminated in this order, arranging the semiconductor chips on the first thermosetting resin layer to face the first thermosetting resin layer to the first main surfaces of the semiconductor chips, laminating a second thermosetting resin layer over the first thermosetting resin layer to cover the semiconductor chips, and curing the radiation curable pressure-sensitive adhesive layer by irradiating from the support side to peel the radiation curable pressure-sensitive adhesive layer and the first thermosetting resin layer from each other.
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