发明名称 STRAIN-CONTROLLED ATOMIC LAYER EPITAXY, QUANTUM WELLS AND SUPERLATTICES PREPARED THEREBY AND USES THEREOF
摘要 Processes for forming quantum well structures which are characterized by controllable nitride content are provided, as well as superlattice structures, optical devices and optical communication systems based thereon.
申请公布号 US2013075694(A1) 申请公布日期 2013.03.28
申请号 US201213656852 申请日期 2012.10.22
申请人 TECHNION RESEARCH & DEVELOPMENT FOUNDATION LTD;TECHNION RESEARCH & DEVELOPMENT FOUNDATION LTD. 发明人 ALBO ASAF;BAHIR GAD;FEKETE DAN
分类号 H01L31/0352;H01L33/04 主分类号 H01L31/0352
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