发明名称 PLATING CURRENT DENSITY DISTRIBUTION MEASUREMENT DEVICE AND PLATING CURRENT DENSITY DISTRIBUTION MEASUREMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a unit that achieves accurate measurement of in-plane distribution of a plating current density in a cathode plate. <P>SOLUTION: The plating current density distribution measurement device includes: a plating bath; an anode and a member to be plated that are at least partially disposed under the surface of a plating solution contained in the plating bath; a first current measuring body comprising a first insulator and a first measurement electrode formed on one surface of the first insulator and disposed so that the first insulator faces a part of the surface to be plated of the member to be plated; a plating power supply; a first wiring for electrically connecting an anode terminal of the plating power supply to the anode; a second wiring for electrically connecting a cathode terminal of the plating power supply to the member to be plated; a third wiring for electrically connecting the cathode terminal of the plating power supply to the first measurement electrode so that the first measurement electrode and the member to be plated form a parallel relationship; and a first current measurement device disposed in the third wiring. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013057098(A) 申请公布日期 2013.03.28
申请号 JP20110195666 申请日期 2011.09.08
申请人 YUKEN INDUSTRY CO LTD 发明人 KIKUCHI YOSHIHARU
分类号 C25D13/22 主分类号 C25D13/22
代理机构 代理人
主权项
地址