THIN FILM, PATTERN LAYER AND MANUFACTURING METHOD THEREOF

摘要

The present invention provides a pattern layer and a manufacturing method thereof. The manufacturing method of the pattern layer comprises: coating a substrate with a film and controlling a coating parameter to change with time, to form a thin film with a film substance changing with the thickness of the coated film on the substrate; etching the thin film so that a lateral etching rate of the thin film changes with the film substance, to form a pattern layer having a side surface with a predetermined curvature. The present invention further provides a thin film. By means of the foregoing method, the lateral etching rate of the thin film can be controlled through the change of the film substance.