System useful for irradiating and processing substrates with high-performance ultra-short pulse laser, comprises laser beam source, energy modulation unit, beam forming- or beam focusing unit, rotational axis, linear axis and cylinder

摘要

System comprises a laser beam source (1), a power or energy modulation unit (21), a beam forming- or beam focusing unit (31), at least a rotational axis, a linear axis (37) and a cylinder (71). The rotational axis and the linear axis are arranged coaxially to one another. The substrate to be processed is mounted on the outer or inner circumferential surface of the cylinder or at the end face of the cylinder. The surface of the substrate is scanned through the rotational axis and the linear axis of the laser spot.