发明名称 |
INFRARED SENSOR, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an infrared sensor whose support part having an infrared detector is positioned at a place facing to a recess and is prevented from adhering to a bottom of the recess. <P>SOLUTION: An infrared sensor includes: a substrate 2; an insulating film 14 which is installed on the substrate 2 and which includes a recess 15 surrounding a cavity 17; a support part 23 which is supported by a beam 22 whose one end is fixed to the substrate 2 and which is positioned at a place facing to the cavity 17; and an infrared detector 4 which is installed on the support part 23 and which detects infrared. The recess 15 is covered by a water-repellent film 16 including polysilicon, and the beam 22 and the support part 23 include a silicon nitride or a silicon carbonitride. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013057526(A) |
申请公布日期 |
2013.03.28 |
申请号 |
JP20110194658 |
申请日期 |
2011.09.07 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MIYASHITA KAZUYUKI |
分类号 |
G01J1/02;G01J5/34;G01J5/48;H01L27/144;H01L27/146;H01L37/02;H04N5/225 |
主分类号 |
G01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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