发明名称 INFRARED SENSOR, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an infrared sensor whose support part having an infrared detector is positioned at a place facing to a recess and is prevented from adhering to a bottom of the recess. <P>SOLUTION: An infrared sensor includes: a substrate 2; an insulating film 14 which is installed on the substrate 2 and which includes a recess 15 surrounding a cavity 17; a support part 23 which is supported by a beam 22 whose one end is fixed to the substrate 2 and which is positioned at a place facing to the cavity 17; and an infrared detector 4 which is installed on the support part 23 and which detects infrared. The recess 15 is covered by a water-repellent film 16 including polysilicon, and the beam 22 and the support part 23 include a silicon nitride or a silicon carbonitride. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013057526(A) 申请公布日期 2013.03.28
申请号 JP20110194658 申请日期 2011.09.07
申请人 SEIKO EPSON CORP 发明人 MIYASHITA KAZUYUKI
分类号 G01J1/02;G01J5/34;G01J5/48;H01L27/144;H01L27/146;H01L37/02;H04N5/225 主分类号 G01J1/02
代理机构 代理人
主权项
地址