发明名称 METHOD AND SYSTEM FOR FORMING CHALCOGENIDE SEMICONDUCTOR MATERIALS USING SPUTTERING AND EVAPORATION FUNCTIONS
摘要 A method and system for forming a chalcogenide or chalcopyrite-based semiconductor material provide for the simultaneous deposition of metal precursor materials from a target and Se radials from a Se radical generation system. The Se radical generation system includes an evaporator that produces an Se vapor and a plasma chamber that uses a plasma to generate a flux of Se radicals. Multiple such deposition operations may take place in sequence, each having the deposition temperature accurately controlled. The deposited material may include a compositional concentration gradient or may be a composite material, and may be used as an absorber layer in a solar cell.
申请公布号 US2013075247(A1) 申请公布日期 2013.03.28
申请号 US201113239989 申请日期 2011.09.22
申请人 LEE WEN-CHIN;YEN WEN-TSAI;CHIU YUNG-SHENG;CHAO YING CHEN;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LEE WEN-CHIN;YEN WEN-TSAI;CHIU YUNG-SHENG;CHAO YING CHEN
分类号 C23C14/34 主分类号 C23C14/34
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