发明名称 |
Beam Monitoring Device, Method, And System |
摘要 |
A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in a longitudinal direction and to facilitate rotation of the beam monitoring device about an axis.
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申请公布号 |
US2013075624(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
US201113241392 |
申请日期 |
2011.09.23 |
申请人 |
HWANG CHIH-HONG;CHANG CHUN-LIN;CHENG NAI-HAN;YANG CHI-MING;LIN CHIN-HSIANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HWANG CHIH-HONG;CHANG CHUN-LIN;CHENG NAI-HAN;YANG CHI-MING;LIN CHIN-HSIANG |
分类号 |
H01J3/26 |
主分类号 |
H01J3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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