发明名称 Beam Monitoring Device, Method, And System
摘要 A beam monitoring device, method, and system is disclosed. An exemplary beam monitoring device includes a one dimensional (1D) profiler. The 1D profiler includes a Faraday having an insulation material and a conductive material. The beam monitoring device further includes a two dimensional (2D) profiler. The 2D profiler includes a plurality of Faraday having an insulation material and a conductive material. The beam monitoring device further includes a control arm. The control arm is operable to facilitate movement of the beam monitoring device in a longitudinal direction and to facilitate rotation of the beam monitoring device about an axis.
申请公布号 US2013075624(A1) 申请公布日期 2013.03.28
申请号 US201113241392 申请日期 2011.09.23
申请人 HWANG CHIH-HONG;CHANG CHUN-LIN;CHENG NAI-HAN;YANG CHI-MING;LIN CHIN-HSIANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HWANG CHIH-HONG;CHANG CHUN-LIN;CHENG NAI-HAN;YANG CHI-MING;LIN CHIN-HSIANG
分类号 H01J3/26 主分类号 H01J3/26
代理机构 代理人
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