发明名称 |
A PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USE |
摘要 |
<p>A PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USEA flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber.</p> |
申请公布号 |
SG188141(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
SG20130010210 |
申请日期 |
2009.02.06 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KADKHODAYAN, BOBBY;MCCHESNEY, JON;PAPE, ERIC;DHINDSA, RAJINDER |
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