发明名称 VACUUM PUMP EXHAUST PIPE OF CHEMICAL VAPOR DEPOSITION APPARATUS AND RELEVANT VACUUM PUMP
摘要 Disclosed is a vacuum pump exhaust pipe of a chemical vapor deposition apparatus, wherein two ports of the vacuum pump exhaust pipe are respectively connected to a vacuum pump outlet and a scrubber, and anti-sticking inner pipes are installed inside the exhaust pipe and closely contacted with inner walls of the exhaust pipe. The present invention also relates to a vacuum pump of the chemical vapor deposition apparatus. Blockage hardly occurs in the vacuum pump exhaust pipe of the chemical vapor deposition apparatus and the relevant vacuum pump according to the present invention to solve problems of the easily found blockage in the exhaust pipe, wasting the manpower and the time for clearing the exhaust pipe and the effect to the uptime of the chemical vapor deposition apparatus in the prior arts.
申请公布号 US2013076032(A1) 申请公布日期 2013.03.28
申请号 US201113378265 申请日期 2011.09.27
申请人 CHEN PENG;SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 CHEN PENG
分类号 F16L21/00 主分类号 F16L21/00
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