发明名称 LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD
摘要 A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
申请公布号 US2013077079(A1) 申请公布日期 2013.03.28
申请号 US201213603168 申请日期 2012.09.04
申请人 DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;VENEMA WILLEM JURRIANUS;MACHT LUKASZ JERZY;KHUAT DUY LAURENT;SARRI DIMITRA;ASML NETHERLANDS B.V. 发明人 DEN BOEF ARIE JEFFREY;BENSCHOP JOZEF PETRUS HENRICUS;BRINKHOF RALPH;VENEMA WILLEM JURRIANUS;MACHT LUKASZ JERZY;KHUAT DUY LAURENT;SARRI DIMITRA
分类号 G03F9/00;G01B11/06 主分类号 G03F9/00
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