PLASMA-GENERATING SOURCE COMPRISING A BELT-TYPE MAGNET, AND THIN-FILM DEPOSITION SYSTEM USING SAME

摘要

The present invention relates to a plasma-generating source which generates uniform and high-density plasma at a high vacuum level, and to a use thereof. The object of the present invention is to obtain a high-quality thin film by using the plasma-generating source in a thin-film deposition system which comprises: a device for sputtering a similar plasma-generating source, a neutral particle-beam generating source, or a combination of the device for sputtering and the neutral particle-beam generating source. According to the present invention, a magnetic field formed by at least one pair of belt-type magnets, and microwaves generated by a microwave-radiation device, are used to generate plasma, and a continuous structure of the belt-type magnets is used to induce a return path for electrons so as to maximize a plasma-confinement effect, thereby achieving the above object.