发明名称 SEMICONDUCTOR INCLUDING LATERAL HEMT
摘要 A semiconductor including a lateral HEMT and to a method for production of a lateral HEMT is disclosed. In one embodiment, the lateral HEMT has a substrate and a first layer, wherein the first layer has a semiconductor material of a first conduction type and is arranged at least partially on the substrate. Furthermore, the lateral HEMT has a second layer, wherein the second layer has a semiconductor material and is arranged at least partially on the first layer. In addition, the lateral HEMT has a third layer, wherein the third layer has a semiconductor material of a second conduction type, which is complementary to the first conduction type, and is arranged at least partially in the first layer.
申请公布号 US2013075790(A1) 申请公布日期 2013.03.28
申请号 US201213681958 申请日期 2012.11.20
申请人 INFINEON TECHNOLOGIES AUSTRIA AG;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 HIRLER FRANZ;RIEGER WALTER;ZUNDEL MARKUS
分类号 H01L29/778 主分类号 H01L29/778
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