发明名称 SMOOTHING LAYER AND BARRIER LAYER ON Tg SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a high temperature substrate having ultra-low gas and liquid permeation, scratch resistance, and chemical resistance, which can be used as a support for display devices. <P>SOLUTION: This high temperature substrate includes: a polymer substrate 105 having a glass transition temperature greater than 120&deg;C; a first barrier stack 115 including a first barrier layer 120 on the polymer substrate and a first polymer layer 125 on the first barrier layer; an environmentally sensitive display device placed on the first barrier stack; a second barrier stack including a second barrier layer on the environmentally sensitive display device and a second polymer layer on the second barrier layer; and a polymer smoothing layer 110 between the polymer substrate and the first barrier stack; and a lid placed on the second barrier stack. The first barrier layer is vapor deposited. The first polymer layer is a vacuum vapor deposited acrylate-containing polymer layer. An oxygen permeation rate through the first barrier stack is low. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013056546(A) 申请公布日期 2013.03.28
申请号 JP20120214994 申请日期 2012.09.27
申请人 SAMSUNG DISPLAY CO LTD 发明人 GRAFF GORDON LEE;GROSS MARK EDWARD;SHI MING KUN;HALL MICHAEL GENE;MARTIN PETER MACLYN;MAST ERIC SIDNEY
分类号 B32B9/00;B32B27/30;B05D7/24;B32B7/04;G02F1/1333;H01L51/52 主分类号 B32B9/00
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