| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a magnetron sputter cathode that can prevent a target from causing local erosion therein and improve utilization efficiency of the target. <P>SOLUTION: The magnetron sputter cathode includes: the target 1a having a three-dimensional shaped outline; and a magnet unit 2a for exciting a tunnel-like magnetic field. The magnet unit is configured so that the surface of the target is used as sputter surfaces 12a, 12c that are partially eroded by sputtering; and a line passing through a position where a vertical component of the magnetic field becomes zero, and circles around the target while striding over the sputter surfaces. <P>COPYRIGHT: (C)2013,JPO&INPIT |
