| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of easily forming a fine pattern on a substrate. <P>SOLUTION: An exposure method of lighting a mask M1 by illumination light and exposing a substrate P using a mask pattern of the mask M1 comprises: moving the substrate P relative to the mask M1 in a scanning direction in a plane of the substrate P; and exposing the substrate P during movement in the scanning direction. The exposure of the substrate P during movement includes a fine period exposure using a fine period mask pattern formed in a first area of the mask M1 and a medium density exposure using a medium density mask pattern formed in a second area of the mask M1 in a stationary state of the mask with the first area and the second area. The first area and the second area are adjacently disposed in the scanning direction. <P>COPYRIGHT: (C)2013,JPO&INPIT |
