发明名称 |
DEVICE AND METHOD FOR GAS TREATMENT USING LOW-TEMPERATURE PLASMA AND CATALYST MEDIUM |
摘要 |
[Problem] To provide a device and a method for oxidation decomposition treatment of a hazardous gas of a volatile organic compound (VOC) or the like at normal temperature. [Solution] A gas treatment device characterized in being provided with a plasma-generating unit and a catalyst medium. The plasma-generating unit is provided with at least a flow channel through which a gas to be treated flows; and a power-supply unit for supplying electrical power, a first electrode, a second electrode, and a dielectric material arranged inside the flow channel. A voltage is impressed between the first electrode and the second electrode by the power-supply unit and electrical discharging is caused to occur, whereby plasma is generated. The catalyst medium is adapted for accelerating a reaction with the gas to be treated and is provided in a position where the plasma generated by the plasma-generating unit inside the flow channel is present, wherein the catalyst medium has metallic catalytic particles present on an inorganic substance. |
申请公布号 |
WO2013042328(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
WO2012JP05600 |
申请日期 |
2012.09.04 |
申请人 |
NBC MESHTEC, INC.;IKEGAMI, MAKOTO;MATSUMOTO, TAKANORI;NAKAYAMA, TSURUO |
发明人 |
IKEGAMI, MAKOTO;MATSUMOTO, TAKANORI;NAKAYAMA, TSURUO |
分类号 |
B01D53/86;A61L9/00;B01J8/02;B01J23/10;B01J23/42;B01J23/44;B01J23/52 |
主分类号 |
B01D53/86 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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