发明名称 METHOD AND APPARATUS FOR RECONDITIONING A CARRIER WAFER FOR REUSE
摘要 The disclosed subject matter pertains to deposition of thin film or thin foil materials in general, but more specifically to deposition of epitaxial monocrystalline or quasi-monocrystalline silicon film (epi film) for use in manufacturing of high efficiency solar cells. In operation, methods are disclosed which extend the reusable life and to reduce the amortized cost of a reusable substrate or template used in the manufacturing process of silicon and other semiconductor solar cells.
申请公布号 WO2012162704(A3) 申请公布日期 2013.03.28
申请号 WO2012US39891 申请日期 2012.05.29
申请人 SOLEXEL, INC.;KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.;ASHJAEE, JAY;RANA, VIRENDRA, V.;YOKOI, SEIICHI;RICOLCOL, RAFAEL 发明人 KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.;ASHJAEE, JAY;RANA, VIRENDRA, V.;YOKOI, SEIICHI;RICOLCOL, RAFAEL
分类号 H01L31/042;H01L31/0216;H01L31/18 主分类号 H01L31/042
代理机构 代理人
主权项
地址