METHOD AND APPARATUS FOR RECONDITIONING A CARRIER WAFER FOR REUSE
摘要
The disclosed subject matter pertains to deposition of thin film or thin foil materials in general, but more specifically to deposition of epitaxial monocrystalline or quasi-monocrystalline silicon film (epi film) for use in manufacturing of high efficiency solar cells. In operation, methods are disclosed which extend the reusable life and to reduce the amortized cost of a reusable substrate or template used in the manufacturing process of silicon and other semiconductor solar cells.
申请公布号
WO2012162704(A3)
申请公布日期
2013.03.28
申请号
WO2012US39891
申请日期
2012.05.29
申请人
SOLEXEL, INC.;KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.;ASHJAEE, JAY;RANA, VIRENDRA, V.;YOKOI, SEIICHI;RICOLCOL, RAFAEL
发明人
KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.;ASHJAEE, JAY;RANA, VIRENDRA, V.;YOKOI, SEIICHI;RICOLCOL, RAFAEL