发明名称 |
ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL |
摘要 |
<p>ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEALA plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.FIG. lA</p> |
申请公布号 |
SG188140(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
SG20130010202 |
申请日期 |
2009.02.06 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
TAPPAN, JAMES E.;STEVENOT, SCOTT JEFFERY |
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