| 摘要 |
PURPOSE: A nanolayer deposition process for a composite layer is provided to improve surface coverage properties of deposition layers by controlling substrate surface properties in a film growth process. CONSTITUTION: One or more first precursors are inputted to a reaction chamber(40). A first layer is deposited from one or more first precursors on a substrate without a limit. One or more second precursors are inputted to the reaction chamber(42). A second layer is deposited from one or more second precursors. The second precursor is removed or purged from a process chamber(43). A sequence is repeated until a desirable thickness of a composite layer is obtained(44). [Reference numerals] (40) Inputting a first precursor to deposit a thin layer; (41,43) Purging the precursor; (42) Inputting a second precursor to modify the deposited thin layer properties; (44) Repeating until the desired thickness is achieved
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