发明名称 Plasma Analyzer Apparatus
摘要 PURPOSE: A plasma inspection apparatus is provided to prevent the generation of particle accumulation by changing gas between a first electrode plate and a second electrode plate into plasma state. CONSTITUTION: A plasma generation unit(130) comprises an RF(Radio Frequency) power, a first electrode plate, and a second electrode plate. The first electrode plate and the second electrode plate are connected to the RF power. The first electrode plate and the second electrode plate are arranged to be faced each other in an internal space of a gas flow unit main body. The plasma generation unit creates light by changing gas passing through the gas flow unit main body into plasma state. A spectral unit(150) splits the light and changes it into an electric signal. [Reference numerals] (110) Gas flow unit; (130) Plasma generation unit; (150) Spectral unit; (170) Control unit
申请公布号 KR101247540(B1) 申请公布日期 2013.03.26
申请号 KR20110035675 申请日期 2011.04.18
申请人 发明人
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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