| 摘要 |
A photosensitive resin composition for resin black matrix and the resin black matrix using the same are provided to show excellent sensitivity, adhesion force to a substrate, heat resistance and pattern stability and to improve development margin and coating uniformity. A photosensitive resin composition for resin black matrix contains compounds with acrylate multi-functional groups in main chains represented by the formula 1. In the formula 1, R1 and R2 are identically or differently hydrogen or methyl group; Y is residue of acid anhydride; Z is residue of acid dianhydride; and a molar ratio of m and n is 100:0~0:100. The photosensitive resin composition comprises: 100 parts of compounds having the acrylate multi-functional groups; 0.1-99wt% of multi-functional monomers; 0.1-80 parts of silicone-based compound containing epoxy groups; 0.01-20 parts of photopolymerization initiator or photosensitizer; a pigment; and a solvent. |
