发明名称 Self-aligned contacts in carbon devices
摘要 A method for forming a semiconductor device includes forming a carbon material on a substrate, forming a gate stack on the carbon material, removing a portion of the substrate to form at least one cavity defined by a portion of the carbon material and the substrate, and forming a conductive contact in the at least one cavity.
申请公布号 US8404539(B2) 申请公布日期 2013.03.26
申请号 US20100832224 申请日期 2010.07.08
申请人 CHANG JOSEPHINE B.;GUO DECHAO;HAN SHU-JEN;LIN CHUNG-HSUN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANG JOSEPHINE B.;GUO DECHAO;HAN SHU-JEN;LIN CHUNG-HSUN
分类号 H01L21/8238 主分类号 H01L21/8238
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