| 摘要 |
According to one embodiment, semiconductor memory device includes: semiconductor substrate; parallel first lines stacked on substrate; parallel second lines intersecting first lines; memory cell array including memory cells at intersections of first and second lines and each including variable resistance element and selecting element series-connected together; first control circuit provided in second region of substrate adjoining first region immediately under array; second control circuit provided in first region of substrate; and dummy lines formed in same layer as second lines, such that they intersect first lines in region above first control circuit. First control circuit applies first voltage to selected first line. Second control circuit applies second voltage lower than first voltage to selected second line, and to dummy lines, third voltage by which potential difference applied to memory cells at intersections of selected first line and dummy lines becomes lower than on-voltage of selecting element. |
