发明名称 Disabling electrical connections using pass-through 3D interconnects and associated systems and methods
摘要 Pass-through 3D interconnects and microelectronic dies and systems of stacked dies that include such interconnects to disable electrical connections are disclosed herein. In one embodiment, a system of stacked dies includes a first microelectronic die having a backside, an interconnect extending through the first die to the backside, an integrated circuit electrically coupled to the interconnect, and a first electrostatic discharge (ESD) device electrically isolated from the interconnect. A second microelectronic die has a front side coupled to the backside of the first die, a metal contact at the front side electrically coupled to the interconnect, and a second ESD device electrically coupled to the metal contact. In another embodiment, the first die further includes a substrate carrying the integrated circuit and the first ESD device, and the interconnect is positioned in the substrate to disable an electrical connection between the first ESD device and the interconnect.
申请公布号 US8404521(B2) 申请公布日期 2013.03.26
申请号 US201213572461 申请日期 2012.08.10
申请人 CHAINE MICHAEL;KIRBY KYLE K.;HIATT WILLIAM M.;SLIFER RUSSELL D.;MICRON TECHNOLOGY, INC. 发明人 JANZEN JEFFERY W.;CHAINE MICHAEL;KIRBY KYLE K.;HIATT WILLIAM M.
分类号 H01L21/00 主分类号 H01L21/00
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