发明名称 |
Source module, radiation source and lithographic apparatus |
摘要 |
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location. |
申请公布号 |
US8405055(B2) |
申请公布日期 |
2013.03.26 |
申请号 |
US20090566060 |
申请日期 |
2009.09.24 |
申请人 |
LABETSKI DZMITRY;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;ASML NETHERLANDS B.V. |
发明人 |
LABETSKI DZMITRY;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;MOORS JOHANNES HUBERTUS JOSEPHINA;SWINKELS GERARDUS HUBERTUS PETRUS MARIA |
分类号 |
H05H1/42 |
主分类号 |
H05H1/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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