发明名称 |
A GAS SUPPLY UNIT OF A CHEMICAL VAPOR DEPOSITION APPARATUS AND A METHOD FOR MANUFACTURING THEREOF |
摘要 |
PURPOSE: A gas supply unit of a chemical vapor deposition apparatus and a method for manufacturing the same are provided to uniformly supply process gas by using nozzles for different gas. CONSTITUTION: A first tube and a second tube(150,160) penetrate a first plate(110) and a second plate(120). A third plate is arranged on the upper part of the second plate. A discharging hole(132) removes foreign substances remaining in a gas chamber. A blocking member shields the discharging hole.
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申请公布号 |
KR20130029587(A) |
申请公布日期 |
2013.03.25 |
申请号 |
KR20110092939 |
申请日期 |
2011.09.15 |
申请人 |
LIGADP CO., LTD. |
发明人 |
LEE, CHANG YEOB;LEE, JAE MOO |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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