发明名称 METHOD OF FABRICATING PHOTOMASK BLANK
摘要 An opaque area is formed in a sidewall portion of a susceptor (12) by stacking a material (12a) that is transparent to flash light and a material (12b) that is opaque to the flash light to form the sidewall portion or coating a surface of the opaque material (12b) with the transparent material (12a). A top surface of the opaque area in the sidewall portion of the susceptor (12) is designed to have a predetermined positional relationship with a top surface of a substrate (10); the top surface of the opaque area is set at the same position as that of the top surface of the substrate or higher than the top surface of the substrate by a predetermined height (H). Thus, obliquely incident flash light is absorbed or irregularly reflected by the opaque quartz portion (12b), surrounding an excavated portion of the susceptor (12).
申请公布号 KR101245468(B1) 申请公布日期 2013.03.25
申请号 KR20070096428 申请日期 2007.09.21
申请人 发明人
分类号 G03F1/26;G03F1/68;H01L21/027 主分类号 G03F1/26
代理机构 代理人
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