发明名称 |
METHOD FOR FABRICATING STACKED NITRIDE-COMPOUND SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING NITRIDE-COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE |
摘要 |
<p>PURPOSE: A method for fabricating a stacked nitride compound semiconductor structure and a method for fabricating a nitride compound semiconductor light emitting device are provided to maintain the flatness of a substrate surface. CONSTITUTION: A first protection layer is formed on a second surface(11b) of a substrate(11). A first nitride semiconductor layer(12) is formed on a first surface(11a) of the substrate. A second protection layer is formed on the first nitride semiconductor layer. The first protection layer is removed to expose a second surface of the substrate. A second nitride semiconductor layer(13) is formed in the second surface of the substrate.</p> |
申请公布号 |
KR20130029324(A) |
申请公布日期 |
2013.03.22 |
申请号 |
KR20120026589 |
申请日期 |
2012.03.15 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KAI KENICHIRO;SUGAWARA HIDETO |
分类号 |
H01L21/20;H01L33/32;H01L33/44 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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