发明名称 METHOD FOR FABRICATING STACKED NITRIDE-COMPOUND SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING NITRIDE-COMPOUND SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 <p>PURPOSE: A method for fabricating a stacked nitride compound semiconductor structure and a method for fabricating a nitride compound semiconductor light emitting device are provided to maintain the flatness of a substrate surface. CONSTITUTION: A first protection layer is formed on a second surface(11b) of a substrate(11). A first nitride semiconductor layer(12) is formed on a first surface(11a) of the substrate. A second protection layer is formed on the first nitride semiconductor layer. The first protection layer is removed to expose a second surface of the substrate. A second nitride semiconductor layer(13) is formed in the second surface of the substrate.</p>
申请公布号 KR20130029324(A) 申请公布日期 2013.03.22
申请号 KR20120026589 申请日期 2012.03.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAI KENICHIRO;SUGAWARA HIDETO
分类号 H01L21/20;H01L33/32;H01L33/44 主分类号 H01L21/20
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