| 摘要 |
<P>PROBLEM TO BE SOLVED: To correct intensity distribution in a direction orthogonal to the scan direction of a light beam emitted from a light beam irradiation device, to suppress height difference of a pattern. <P>SOLUTION: A substrate 1 is scanned by a light beam from a light beam irradiation device 20, to draw a pattern on the substrate 1. A drawing control unit 71 supplies drawing data for drawing a pattern and correction data for drawing a correction pattern to a drive circuit (DMD drive circuit 27) of the light beam irradiation device 20, so that the correction pattern where a position or a width in a direction orthogonal to the scan direction changes in the scan direction is drawn and superimposed over the drawn pattern in the scan direction. <P>COPYRIGHT: (C)2013,JPO&INPIT |
