| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a pattern that simultaneously satisfies demands for high sensitivity, high resolution (for example, excellent pattern features and low line edge roughness (LER)), reduction of scum and reduction of development defects, and to provide a resist film, a resist-coated mask blank, a method for forming a resist pattern and a photomask using the composition. <P>SOLUTION: The negative actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a polymeric compound having a repeating unit (a) that generates an acid by irradiation with actinic rays or radiation and a repeating unit (b) having a phenolic hydroxyl group; and (B) a crosslinking agent. <P>COPYRIGHT: (C)2013,JPO&INPIT |
