| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which sufficiently satisfies a mask error factor (MEF) in the production of a resist pattern and a new salt included in the resist composition. <P>SOLUTION: The salt is shown by formula (I). In formula (I), Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>represent a fluorine atom or the like. L<SP POS="POST">1</SP>represents an aliphatic saturated hydrocarbon group or the like, wherein the methylene group in the aliphatic saturated hydrocarbon group may be replaced with an oxygen atom or the like. L<SP POS="POST">2</SP>represents an aliphatic saturated hydrocarbon group, wherein the methylene group in the aliphatic saturated hydrocarbon group may be replaced with an oxygen atom. -NR<SP POS="POST">2</SP>- or the like. R<SP POS="POST">2</SP>represents a hydrogen atom or an alkyl group. The ring W represents an alicyclic ring, wherein the methylene group composing the alicyclic ring may be replaced with an oxygen atom or the like, and the hydrogen atom included in the alicyclic ring may be replaced with a hydroxy group or the like. R<SP POS="POST">1</SP>represents a univalent organic group including a fluorine substituted aromatic ring, wherein the organic group may have a substituent. Z<SP POS="POST">+</SP>represents an organic counter ion. <P>COPYRIGHT: (C)2013,JPO&INPIT |
