| 发明名称 |
SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for adjusting a resist composition so as to obtain a rectangular pattern without leaving patterns for optical proximity correction when using the optical proximity correction technology. <P>SOLUTION: This salt is expressed by formula (I) (wherein Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each represents F or 1-6C perfluoroalkyl; L<SP POS="POST">1</SP>represents 1-20C trivalent aliphatic saturated hydrocarbon or the like; -OH in L<SP POS="POST">1</SP>-OH is bonded to C of a chain moiety in the 1-20C trivalent aliphatic saturated hydrocarbon represented by L<SP POS="POST">1</SP>; W represents 3-36C monovalent alicyclic hydrocarbon or the like; R<SP POS="POST">2</SP>represents H or 1-6C alkyl; and Z<SP POS="POST">+</SP>represents an organic cation). <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013053142(A) |
申请公布日期 |
2013.03.21 |
| 申请号 |
JP20120174708 |
申请日期 |
2012.08.07 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;MUKAI YUICHI;YOSHIDA ISAO |
| 分类号 |
C07C309/17;C07C211/45;C07C381/12;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C07C309/17 |
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