| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface foreign matter inspection method capable of easily detecting foreign matter having a shape of a transparent thin film on a surface by an inspection with an illumination optical system. <P>SOLUTION: In the surface foreign matter inspection method, white light is radiated from a white light source 3 to a top surface of a wafer 10, and when transparent foreign matter 12a exists in a region irradiated with the white light, in the top surface of the wafer 10, monochromatic light is radiated from a monochromatic light source 4 to the wafer 10, by an incident angle θ which generates a dark part by light interference at transparent foreign matter 12, and a common light receiving element 5 receives the white light reflected at the dark part of the monochromatic light in the top surface of the wafer 10 and the monochromatic light reflected at the top surface. <P>COPYRIGHT: (C)2013,JPO&INPIT |
