| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device with a relatively simple structure, which is capable to hold a mask while correcting a sag in the mask and exposure transfer a pattern with a high accuracy, and to provide a proximity exposure method. <P>SOLUTION: In a proximity exposure device, a mask stage 1 comprises: a mask holder 26 holding a mask M on its underside by vacuum chucking; a cover glass 32 held on an upper side of the mask holder 26; a suction mechanism 40 for sucking air in a space 33 defined by the mask holder 26, the mask M, and the cover glass 32 to reduce pressure in the space 33; and at least one air introduction groove 35 for supplying air into the reduced pressure space 33 from outside. The mask M is held on the underside of the mask holder 26 by vacuum chucking the mask M. Additionally, pressure in the space 33 is sucked by the suction mechanism 40, and outside air is supplied to the space 33 via the air introduction groove 35, thereby adjusting the pressure in the space 33 to a predetermined pressure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
