发明名称 COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
摘要 A composition comprising a source of metal ions and at least one leveling agent comprising a linear or branched, polymeric imidazolium compound comprising the structural unit of formula L1 (L1) wherein R1, R2, R3 are each independently selected from an H atom and an organic radical having from 1 to 20 carbon atoms, R4 is a divalent, trivalent or mutlivalent organic radical which does not comprise a hydroxyl group in the α or &bgr; position relative to the nitrogen atom of the imidazole rings is an integer.
申请公布号 US2013068626(A1) 申请公布日期 2013.03.21
申请号 US201113701217 申请日期 2011.05.31
申请人 SIEMER MICHAEL;ROEGER-GOEPFERT CORNELIA;MEIER NICOLE;RAETHER ROMAN BENEDIKT;ARNOLD MARCO;EMNET CHARLOTTE;MAYER DIETER;FLUEGEL ALEXANDER;BASF SE 发明人 SIEMER MICHAEL;ROEGER-GOEPFERT CORNELIA;MEIER NICOLE;RAETHER ROMAN BENEDIKT;ARNOLD MARCO;EMNET CHARLOTTE;MAYER DIETER;FLUEGEL ALEXANDER
分类号 C25D3/38;C25D5/02 主分类号 C25D3/38
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