发明名称 IC LAYOUT PATTERN MATCHING AND CLASSIFICATION SYSTEM AND METHOD
摘要 A system and method for restricting the number of layout patterns by pattern identification, matching and classification, includes decomposing the pattern windows into a low frequency component and a high frequency component using a wavelet analysis for an integrated circuit layout having a plurality of pattern windows. Using the low frequency component as an approximation, a plurality of moments is computed for each pattern window. The pattern windows are classified using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows.
申请公布号 US2013071007(A1) 申请公布日期 2013.03.21
申请号 US201213675537 申请日期 2012.11.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GABRANI MARIA;HURLEY PAUL T.
分类号 G06K9/00 主分类号 G06K9/00
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